Si reacts with CH_3Cl at 573 K in the presen | vedclass

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(D) When heating silicon with methyl chloride at $573 \ K$ in the presence of $Cu$ powder (Direct Process), a mixture of methyl chlorosilanes is forme

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$(CH_3)_4Si$

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(D) When heating silicon with methyl chloride at $573 \ K$ in the presence of $Cu$ powder (Direct Process), a mixture of methyl chlorosilanes is formed: $CH_3SiCl_3$, $(CH_3)_2SiCl_2$, $(CH_3)_3SiCl$, and $(CH_3)_4Si$.Among these, the yield of $(CH_3)_4Si$ (tetramethylsilane) is the minimum.This is because the substitution of all four chlorine atoms by bulky methyl groups is sterically hindered and thermodynamically less favorable compared to the formation of chlorosilanes.

Material	Application
$A$. Silicones	$i$. As a catalyst
	$ii$. Greases
$B$. Zeolites	$iii$. In surgical implants
	$iv$. As ion exchangers

$Si$ reacts with $CH_3Cl$ at $573 \ K$ in the presence of $Cu$ powder to form methyl substituted chlorosilanes. Among the given methyl substituted chlorosilanes, whose yield is minimum?

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Match the following and choose the correct code.
Material Application
$A$. Silicones $i$. As a catalyst
$ii$. Greases
$B$. Zeolites $iii$. In surgical implants
$iv$. As ion exchangers

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