In which of the following statements is the obtained impure semiconductor of $p$-type?

In an $N$-type $Ge$ semiconductor,the mobility of electrons is $5000 \ cm^2/V \cdot s$ and the conductivity is $5 \ mho/cm$. If the effect of holes is negligible,what is the concentration of impurity atoms?

In a $P-$type semiconductor,germanium is doped with

In pure silicon,the electron-hole concentration at $T = 300 \ K$ is $7 \times 10^{15} \ m^{-3}$. Antimony is added as an impurity to silicon at a rate of $1$ atom per $10^7 \ Si$ atoms. Assume that half of the impurity atoms contribute their electrons to the conduction band. Calculate the factor by which the number of charge carriers increases. Given: the number density of silicon atoms is $5 \times 10^{28} \ m^{-3}$.

Mobility of electrons in a semiconductor is defined as the ratio of their drift velocity to the applied electric field. If,for an $n$-type semiconductor,the density of electrons is $10^{19} \ m^{-3}$ and their mobility is $1.6 \ m^2/(V \cdot s)$,then the resistivity of the semiconductor (since it is an $n$-type semiconductor,the contribution of holes is ignored) is close to ................ $\Omega \cdot m$.

$A$ crystal of intrinsic silicon at room temperature has a carrier concentration of $1.6 \times 10^{16} / m^3$. If the donor concentration level is $4.8 \times 10^{20} / m^3$, then the concentration of holes in the semiconductor is