Pure $Si$ at $500\, K$ has equal number of electron $(n_e)$ and hole $(n_h)$ concentrations of $1.5 \times 10^{16}\, m^{-3}$. Doping by indium increases $n_h$ to $4.5 \times 10^{22}\, m^{-3}$. The doped semiconductor is of

  • A
    $p-$ type having electron concentration,$n_e = 5 \times 10^9\, m^{-3}$
  • B
    $n-$ type having electron concentration,$n_e = 5 \times 10^{22}\, m^{-3}$
  • C
    $p-$ type having electron concentration,$n_e = 2.5 \times 10^{10}\, m^{-3}$
  • D
    $n-$ type having electron concentration,$n_e = 2.5 \times 10^{23}\, m^{-3}$

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