Which of the following statements is true for an $N$-type semiconductor?

  • A
    The donor level lies closely below the bottom of the conduction band.
  • B
    The donor level lies closely above the top of the valence band.
  • C
    The donor level lies at the halfway mark of the forbidden energy gap.
  • D
    None of the above.

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The number of silicon atoms per $m^3$ is $5 \times 10^{28}$. This is doped with $4.5 \times 10^{21}$ atoms $/ m^3$ of Arsenic. The ratio of the number of electrons to the number of holes after doping is (Take $n_i = 1.5 \times 10^{16} / m^3$)

$A$ pure $Si$ crystal has $5 \times 10^{28}$ atoms $m^{-3}$. It is doped with $1 \, ppm$ concentration of pentavalent $As$. The number of holes is (Take $n_i = 1.5 \times 10^{16} \, m^{-3}$)

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Which of the following statements is incorrect?

When arsenic is added as an impurity to silicon,the resulting material is

If the number of holes and electrons are represented by $n_h$ and $n_e$ respectively,then which of the following is correct for an intrinsic semiconductor?

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